Energy, Environmental, and Catalysis Applications
- Daniela R. Fontecha*
Daniela R. Fontecha
Department of Materials Science and Engineering at University of Maryland, College Park, Maryland 20742, United States
*Email: [emailprotected]
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- Alexander C. Kozen
Alexander C. Kozen
Department of Physics, College of Engineering and Mathematical Sciences at University of Vermont, Burlington, Vermont 05405, United States
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- David M. Stewart
David M. Stewart
Department of Materials Science and Engineering at University of Maryland, College Park, Maryland 20742, United States
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- Alex T. Hall
Alex T. Hall
Department of Materials Science and Engineering at University of Maryland, College Park, Maryland 20742, United States
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- John Cumings
John Cumings
Department of Materials Science and Engineering at University of Maryland, College Park, Maryland 20742, United States
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- Gary W. Rubloff
Gary W. Rubloff
Department of Materials Science and Engineering at University of Maryland, College Park, Maryland 20742, United States
Insititute for Systems Research at University of Maryland, College Park, Maryland 20742, United States
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- Keith E. Gregorczyk*
Keith E. Gregorczyk
Department of Materials Science and Engineering at University of Maryland, College Park, Maryland 20742, United States
*Email: [emailprotected]
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ACS Applied Materials & Interfaces
Cite this: ACS Appl. Mater. Interfaces 2025, XXXX, XXX, XXX-XXX
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https://pubs.acs.org/doi/10.1021/acsami.5c02201
Published April 17, 2025
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Abstract
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Advancements in ionic devices for energy applications (e.g., solid-state microbatteries, ionic capacitors, ion-tunable transistors, etc.) require significant development of compatible materials and fabrication processes to enable high-performance conduction and storage of ions. Atomic layer deposition (ALD) enables fabrication of solid-state devices with high energy and power densities due to the complex structures made possible by its angstrom-scale thickness control and high conformality. The ionic conductivity of thin film materials fabricated by ALD has been limited by material development and crystallinity control challenges, as suitable materials must be fabricated with both the appropriate composition and crystal structure. A mixed metal phosphate like LiTi2(PO4)3 (LTP) is a prime candidate to push the boundary of ALD ionic materials due to the fast Li+-conducting NASICON-type crystalline phase. We developed a mixed ion-electron conducting NASICON-type thin film ALD process for LiTi2(PO4)3 suitable for microbattery and pseudocapacitor applications. Compositional tunability was achieved by alternating between constituent lithium oxide (Li2O) and titanium phosphate (TiPO) subprocesses. By adjusting the ratio between Li2O and TiPO cycles, the Li content in LTP can be tuned between 8 and 34 atomic % Li. A NASICON-type crystalline structure is observed after postdeposition annealing of the LTP films between 650 and 850 °C. The semicrystalline LTP thin film has an ionic conductivity of 9.3 × 10–7 S/cm at RT and 1.7 × 10–5 S/cm at 80 °C and an electronic conductivity of 2.5 × 10–7 S/cm at RT. In this work, we discuss the complexities of how tuning the composition of LTP influences film properties such as structure and conductivity in the mixed metal phosphate phase space.
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© 2025 American Chemical Society
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- Atomic layer deposition
- Minerals
- Oxides
- Phosphates
- Thin films
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ACS Applied Materials & Interfaces
Cite this: ACS Appl. Mater. Interfaces 2025, XXXX, XXX, XXX-XXX
Click to copy citationCitation copied!
Published April 17, 2025
Publication History
Received
Accepted
Revised
Published
online
© 2025 American Chemical Society
Request reuse permissions
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